Special Issue: Advances in Chemical Vapor Deposition
نویسندگان
چکیده
منابع مشابه
Spatially controllable chemical vapor deposition
Most conventional chemical vapor deposition (CVD) systems do not have the spatial actuation and sensing capabilities necessary to control deposition uniformity, or to intentionally induce nonuniform deposition patterns for single-wafer combinatorial CVD experiments. In an effort to address this limitation, a novel CVD reactor system has been developed that can explicitly control the spatial pro...
متن کاملPlasmon-assisted chemical vapor deposition.
We introduce a new chemical vapor deposition (CVD) process that can be used to selectively deposit materials of many different types. The technique makes use of the plasmon resonance in nanoscale metal structures to produce the local heating necessary to initiate deposition when illuminated by a focused low-power laser. We demonstrate the technique, which we refer to as plasmon-assisted CVD (PA...
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The fundamental surface chemistry underlying selectivity in copper chemical vapor deposition (CVD) from COD-Cu-hfac and Cu(hfac), has been determined. Both electronic and chemistry contributions strongly influence the precursor reactivity on oxide as compared to metal surfaces. These results have important implications regarding the role of surface preparation and cleaning for initiating and ma...
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ژورنال
عنوان ژورنال: Materials
سال: 2020
ISSN: 1996-1944
DOI: 10.3390/ma13184167